
Quantum X
Technology | Other resin |
Material | Photopolymers |
Topic | Micro AM, Resin |
Build size | - |
Release date | 2019 |
Country | Germany |
Nanoscribe Quantum X overview
Nanoscribe Quantum X is the first Two-Photon Grayscale Lithography (2GL ®) system and advances maskless microfabrication in the field of microoptics and functional surfaces. Nanoscribe’s Two-Photon Grayscale Lithography combines Two-Photon Polymerization (2PP) with the qualities of grayscale lithography to enable fast and precise microfabrication of ultra-smooth surfaces and structures with excellent shape accuracy.
Thus, Nanoscribe Quantum X redefines the fabrication of topographies with optical-quality surfaces, for freeform microoptics, microlens arrays and multi-level diffractive optical elements (DOEs). 2D and 2.5D optical elements such as Fresnel lenses for focused illumination or hybrid microoptics, which are a mixture of refractive and diffractive elements, can be manufactured in one single fabrication step.
Nanoscribe Quantum X: key features
- High-speed 2.5D microfabrication
- Ultra-smooth surfaces and excellent shape accuracy
- Design freedom with submicrometer resolution
- Automated processes, e.g., calibration, job execution, and monitoring
Two-Photon Grayscale Lithography (2GL ®) features a dynamic size control over voxels. This is a product of the synchronization of laser power modulation and high-speed galvoscanning with precise lateral stage motion. It enables precise voxel size variation at high scan speeds.
For example, the modulation control of high-resolution print is set to a 100 nm galvoscanner grid. The voxel can be modulated by more than 4,000 levels at each grid point in three-dimensional space, resulting in excellent control of surface topography. Quantum X software controls and monitors print jobs in real time and supports intuitive operation through an interactive touchscreen control panel or from any connected computer.
Quantum X: key specs
- Minimum feature size: 100nm
- Shape accuracy: ≤200nm
- Minimum surface roughness Ra: ≤ 5 nm
Nanoscribe Quantum X price
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Nanoscribe Quantum X technical specifications
General | |
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Model | Quantum X |
Brand | Nanoscribe |
Price Approximate starting prices based on supplier-provided information and public data. Prices may vary by region, over time and do not include additional products or services (taxes, shipping, accessories, training, installation, ...). | $ 500,000 |
Release date | 2019 |
Country | Germany |
Status | Available |
Topic | Micro AM Resin |
Category | Industrial |
Technology | Other resin |
Material | Photopolymers |
Performance | |
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Max. build size | - |
Max. build volume | - |
Max. temperatures | |
Extruder | - |
Build chamber | - |
Build plate | - |
Min. layer thickness | 0.00016 mm |
XY accuracy | - |
Max. print speed | - |
Features | |
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Heated build chamber | - |
Extruder | |
Dual extruder | - |
Independent Dual Extruder (IDEX) | - |
Multiple extruders (3+) | - |
Pellet extruder | - |
Full color | - |
Conveyor belt | - |
5-axis | - |
Hybrid manufacturing | - |
Robotic arm | - |
Connectivity | |
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USB | - |
Wifi | - |
Bluetooth | - |
SD card | - |
Ethernet | - |
Hardware | |
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Dimensions | - |
Weight | - |
Nozzle diameter(s) | - |
Filament diameter | - |