|Technology||Resin > Other|
|Topic||Micro AM (μAM)|
Nanoscribe Quantum X overview
Nanoscribe Quantum X is the first Two-Photon Grayscale Lithography (2GL ®) system and advances maskless microfabrication in the field of microoptics and functional surfaces. Nanoscribe’s Two-Photon Grayscale Lithography combines Two-Photon Polymerization (2PP) with the qualities of grayscale lithography to enable fast and precise microfabrication of ultra-smooth surfaces and structures with excellent shape accuracy.
Thus, Nanoscribe Quantum X redefines the fabrication of topographies with optical-quality surfaces, for freeform microoptics, microlens arrays and multi-level diffractive optical elements (DOEs). 2D and 2.5D optical elements such as Fresnel lenses for focused illumination or hybrid microoptics, which are a mixture of refractive and diffractive elements, can be manufactured in one single fabrication step.
Nanoscribe Quantum X: key features
- High-speed 2.5D microfabrication
- Ultra-smooth surfaces and excellent shape accuracy
- Design freedom with submicrometer resolution
- Automated processes, e.g., calibration, job execution, and monitoring
Two-Photon Grayscale Lithography (2GL ®) features a dynamic size control over voxels. This is a product of the synchronization of laser power modulation and high-speed galvoscanning with precise lateral stage motion. It enables precise voxel size variation at high scan speeds.
For example, the modulation control of high-resolution print is set to a 100 nm galvoscanner grid. The voxel can be modulated by more than 4,000 levels at each grid point in three-dimensional space, resulting in excellent control of surface topography. Quantum X software controls and monitors print jobs in real time and supports intuitive operation through an interactive touchscreen control panel or from any connected computer.
Quantum X: key specs
- Minimum feature size: 100nm
- Shape accuracy: ≤200nm
- Minimum surface roughness Ra: ≤ 5 nm
Nanoscribe Quantum X price
Please contact us to get a quote.
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